Application of laser ion source for ion implantation technology

Vacuum

Volumn 78, Issue 2-4, 2005, Pages 435-438

  Rosinski M ^a   Badziak, J ^a   Boody, F P ^b   Gammino, S ^c   Hora, H ^d   Krasa J ^e   Laska L ^e   Mezzasalma, A M ^f   Parys, P ^a   Rohlena, K ^e   Torrisi, L ^c,f   Ullschmied, J ^g   Wolowski J ^a   Woryna, E ^a  

^a SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^b Ion Light Technologies GmbH   (Germany)

^c INFN LABORATORI NAZIONALI DEL SUD   (Italy)

^d UNIVERSITY OF NEW SOUTH WALES   (Australia)

^e INSTITUTE OF PHYSICS   (Czech Republic)

^f UNIVERSITY OF MESSINA   (Italy)

^g INSTITUTE OF PLASMA PHYSICS   (Czech Republic)

Author keywords

Laser ion source; Laser matter interaction

Indexed keywords

ION SOURCES; LASER PRODUCED PLASMAS; LASERS; MICROWAVES; PLASMA INTERACTIONS; POLYMERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR MATERIALS;

ENERGY DISTRIBUTION; IMPLANTATION DEPTH; LASER ION SOURCE; LASER-MATTER INTERACTION; PLASMA ION SOURCE;

ION IMPLANTATION;

EID: 20844456663     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.01.064     Document Type: Conference Paper

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