Experimental study of aluminum-induced crystallization of amorphous silicon thin films

Surface and Coatings Technology

Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 300-303

  Qi, G J ^a   Zhang, S ^b   Tang, T T ^b   Li, J F ^b   Sun, X W ^b   Zeng, X T ^a  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Aluminum; Amorphous; Polycrystalline; Silicon

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; CRYSTALLIZATION; MORPHOLOGY; POLYSILICON; SILICON WAFERS; SPUTTERING;

ALUMINUM FILMS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); POLYCRYSTALLINE FILMS; SILICON FILMS;

THIN FILMS;

CRYSTALLIZATION;

EID: 20844455170     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.10.092     Document Type: Article

References (9)

1. T. Matsuyama N. Terada T. Baba T. Sawada S. Tsuge K. Wakisawa S. Tsuda J. Non-Cryst. Solids 198-200 1996 940
2. R.B. Bergmann G. Oswald M. Albercht V. Gross Sol. Energy Mater. Sol. Cells 46 1997 147
3. J.S. Im R.S. Sposili M.A. Crowder Appl. Phys. Lett. 70 1997 3434
4. C.Y. Yuen M.C. Poon W.Y. Chan J. Appl. Phys. 92 2002 6291
5. S.-W. Lee Y.-C. Jeon S.-K. Joo Appl. Phys. Lett. 66 1995 1671
6. M.S. Haque H.A. Naseem W.D. Brown J. Appl. Phys. 75 1994 3928
7. M.S. Ashtika G.L. Sharma J. Appl. Phys. 78 1995 913
8. O. Nast T. Puzzer L.M. Koschier A.B. Sproul S.R. Wenham Appl. Phys. Lett. 73 1998 3214
9. O. Nast S. Brehme S. Pitchard A.G. Aberle S.R. Wenham Sol. Energy Mater. Sol. Cells 65 2001 385