Role of light scattering in excimer laser annealing of Si

Applied Physics Letters

Volumn 86, Issue 16, 2005, Pages 1-3

  La Magna, Antonino ^a   Alippi, Paola ^a   Privitera, Vittorio ^a   Fortunato, Guglielmo ^b  

^a CNR IMM   (Italy)

^b IFN CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EXCIMER LASERS; FINITE DIFFERENCE METHOD; HEAT TREATMENT; LASER BEAM EFFECTS; LIGHT SCATTERING; TIME DOMAIN ANALYSIS;

EXCIMER LASER ANNEALING; FINITE DIFFERENCE TIME DOMAIN (FDTD); OXIDE LAYERS; ULTRASHALLOW JUNCTIONS (USJ);

SILICON;

EID: 20844441760     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1906318     Document Type: Article

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