Studies of superconducting field effect transistors with sheet resistances close to the quantum resistance

Applied Physics Letters

Volumn 86, Issue 20, 2005, Pages 1-3

  Logvenov, G Yu ^a,c   Schneider, C W ^a   Mannhart, J ^a   Barash, Yu S ^b  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b INSTITUTE OF SOLID STATE PHYSICS   (Russian Federation)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COLOR ONLINE; DRAIN-SOURCE (DS) CHANNEL; QUANTUM RESISTANCE; VOLTAGE CONTACTS;

DIELECTRIC MATERIALS; POLARIZATION; PULSED LASER DEPOSITION; QUANTUM THEORY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUPERCONDUCTING DEVICES;

FIELD EFFECT TRANSISTORS;

EID: 20844441434     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1929077     Document Type: Article

References (6)

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