Voltammetric behavior of nitrofurazone at highly boron doped diamond electrode

Electroanalysis

Volumn 17, Issue 3, 2005, Pages 269-274

  Da Silva Julião, Murilo Sêrgio ^a,b   Almeida, Érica Cristina ^c   La Scalea, Mauro Aquiles ^d   Ferreira, Neidenêi Gomes ^e   Compton, Richard G ^b,f   Serrano, Sílvia Helena Pires ^b  

^a UNIVERSIDADE ESTADUAL VALE DO ACARAÚ   (Brazil)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

^c INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

^d Hospital Universitario   (Brazil)

^e INSTITUTO DE AERONÁUTICA E ESPAÇO   (Brazil)

^f UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Cyclic voltammetry; Highly boron doped diamond film; Mannitol; Nitrofurazone; Radical anion

Indexed keywords

AMINES; ANODIC OXIDATION; BORON; DIAMOND FILMS; ELECTROCHEMICAL ELECTRODES; ELECTRONS; REDUCTION;

% REDUCTIONS; BORON-DOPED DIAMOND ELECTRODES; BORON-DOPED DIAMOND FILMS; BRITTON-ROBINSON BUFFER; ELECTROCHEMICAL BEHAVIORS; HIGHLY BORON DOPED DIAMOND FILM; MANNITOL; NITROFURAZONE; RADICAL ANIONS; VOLTAMMETRIC BEHAVIORS;

CYCLIC VOLTAMMETRY;

EID: 20644455315     PISSN: 10400397     EISSN: None     Source Type: Journal    
DOI: 10.1002/elan.200403093     Document Type: Article

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