Metrologische Charakterisierung von neu entwickelten Photomasken- Strukturbreiten-Normalen

PTB - Mitteilungen Forschen und Prufen

Volumn 114, Issue 1, 2004, Pages 36-43

  Frase, Carl Georg ^a   Bodermann, Bernd ^a   Häßler Grohne, Wolfgang ^a   Czerkas, Slawomir ^a   Mirandé, Werner ^a   Bosse, Harald ^a  

^a PTB Arbeitsgruppe Maskenmesstechnik ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2042514324     PISSN: 0030834X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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10. Frase, C. G.: Untersuchungen zur Signalentstehung mittels SE an Mikrostrukturkanten in einem Niederspannungs-Rasterelektronenmikroskop. Dissertation. PTB-Bericht F-46, (2003), S. 38-44
11. Mirandé, W.; Frase, C. G.: Comparison of Linewidth Measurements on Si Structures performed by Atomic Force Microscopy (AFM) and low Voltage Scanning Electron Microscopy (SEM). Proceedings Quantitative Microscopy (QM '99), Kopenhagen, 1999, PTB-Bericht PTB-F-34, (1999), S. 89-96
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