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Volumn , Issue , 2004, Pages 65-67

Fabrication of magnetic nanostructures using KrF lithography

Author keywords

Lift off; Lithography; Magnetic nanostructures; Nanofabrication; Phase shift mask

Indexed keywords

LIFT-OFF; MAGNETIC NANOSTRUCTURES; NANOFABRICATIONS; PHASE SHIFT MASKS;

EID: 20344405007     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (7)
  • 6
    • 0005188550 scopus 로고    scopus 로고
    • 100-nm node lithography with KrF
    • M. Fritze et al. "100-nm node lithography with KrF" SPIE microlithography, Vol. 4346 (2001), p191.
    • (2001) SPIE Microlithography , vol.4346 , pp. 191
    • Fritze, M.1
  • 7
    • 0141833755 scopus 로고    scopus 로고
    • Application of CPL reticle technology for 65 and 50nm technology node
    • Will Conley et al. "Application of CPL reticle technology for 65 and 50nm technology node" SPIE microlithography 2003, Vol.5040,p392.
    • SPIE Microlithography 2003 , vol.5040 , pp. 392
    • Conley, W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.