The application of CPL reticle technology for the 65 & 50nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 392-398

  Conley, Will ^a   Van Den Broeke, Doug ^b   Socha, Robert ^b   Wu, Wei ^a   Litt, Lloyd ^a   Lucas, Kevin ^a   Nelson Thomas, Carla ^a   Roman, Bernie ^a   Chen, Fung ^b   Wampler, Kurt ^b   Laidig, Tom ^b   Hsu, Stephen ^b   Schaefer, Erika ^b   Cassel, Shawn ^b   Yu, Linda ^b   Kasprowicz, Bryan ^c   Progler, Chris ^c   Petersen, John ^d   Gerold, Dave ^d   Maslow, Mark ^d  

^a MOTOROLA INC   (United States)

^b ASML US Inc   (United States)

^c PHOTRONICS INC   (United States)

^d Petersen Advanced Lithography Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; IMAGE PROCESSING; MASKS; OPTIMIZATION; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE;

CHROMELESS PHASE SHIFTING MASKS; NUMERICAL APERTURE; OFF AXIS ILLUMINATION; RESOLUTION ENHANCEMENT TECHNOLOGY;

LITHOGRAPHY;

EID: 0141833755     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485515     Document Type: Conference Paper

References (10)

1. Wantanabe et al. "Sub-Quarter-Micron Gate Pattern Fabrication using a Transparent Phase Shift Mask", JVS Technology B9(6), Nov/Dec 1991.
2. Toh et al., "Optical Lithography with Chromeless Phase-Shifted Masks", SPIE, vol. 1643, pp. 207-217, 1991.
3. Fritze et al. "Applications of Chromeless Phase-Shifting Masks to sub-100nm SOI CMOS Transistor Fabrication", SPIE, vol. 4000, pp. 388-407, 2000.
4. Patterson et al., "Effect f Quartz Phase Etch on 193nm Alternating Phase Shift Mask Performance for the 100nm Node", SPIE, vol. 4691, pp. 1033-1040, 2002.
5. Karklin et al., "Automatic Defect Severity Scoring for 193nm Reticle Defect Inspection", SPIE, vol. 4346, pp. 898-906, 2001.
6. Chen et al., "System and Method of providing optical proximity correction for features using phase shifted halftone transparent/semi-transparent features," US Patent 6335130 B1.
7. Bryan Kasprowicz et al, CPL Mask Challenges, BACUS, Monterey, CA Sept 2003 to be published
8. Van Den Broeke et. al., "Complex 2D Pattern Lithography at λ/4 Resolution Lithography using Chromeless Phase Lithography (CPL), SPIE vol. 4691, pp. 196-214, 2002.
9. J. F. Chen, J. S. Petersen, P. Socha, T. Laidig, K. E. Wampler, K. Nakagawa, G. Hughes, S. MacDonald, W. Ng, "Binary Halftone Chromeless PSM Technology for Quarter Wavelength Lithography", SPIE Paper 4346-51, Santa Clara, CA (2001)
10. Matsuo et al., "Feasibility Study of an Embedded Transparent Phase-Shifting Mask", SPIE, Vol. 4000, pp. 443-451 (2000)