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Volumn 34, Issue 5, 2005, Pages 564-570
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Dielectric films for Si solar cell applications
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Author keywords
Plasma enhanced chemical vapor deposition (PECVD); SiNiH; Solar cell fabrication
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Indexed keywords
ANTIREFLECTION COATINGS;
DIELECTRIC FILMS;
FABRICATION;
HIGH TEMPERATURE EFFECTS;
HYDROGEN;
OXYGEN;
PHOTOLITHOGRAPHY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
SILICON COMPOUNDS;
SILICON WAFERS;
OXYGEN-RICH WAFERS;
SELF-ALIGNING TECHNIQUES;
SINIH;
SOLAR CELL FABRICATION;
SOLAR CELLS;
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EID: 20344383507
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-005-0066-9 Document Type: Conference Paper |
Times cited : (19)
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References (20)
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