Antiferromagnetic domain structure imaging of cleaved NiO(100) surface using nonmagnetic linear dichroism at O K edge: Essential effect of antiferromagnetic crystal distortion

Journal of the Physical Society of Japan

Volumn 73, Issue 11, 2004, Pages 2932-2935

  Kinoshita, Toyohiko ^a   Wakita, Takanori ^a,d   Sun, Hailin ^a   Tohyama, Takahide ^b,e   Harasawa, Ayumi ^a   Kiwata, Hideyuki ^a,f   Hillebrecht, F Ulrich ^c,g   Ono, Kanta ^a,h   Matsushima, Takeshi ^a   Oshima, Masaharu ^a   Ueno, Nobuo ^b   Okuda, Taichi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b CHIBA UNIVERSITY   (Japan)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^d JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^e Konica Corporation   (Japan)

^f PANASONIC CORPORATION   (Japan)

^g FORSCHUNGSZENTRUM JÜLICH   (Germany)

^h HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

Author keywords

Antiferromagnetic domain; Linear dichroism; NiO; Photoemission electron microscope

Indexed keywords

FERROMAGNETIC MATERIAL; NICKEL; OXYGEN;

ARTICLE; CHEMICAL STRUCTURE; CRYSTAL; FILM; LINEAR DICHROISM; MAGNETISM; MICROSCOPY; PHOTOELECTRON EMISSION MICROSCOPY; X RAY;

EID: 20244368254     PISSN: 00319015     EISSN: None     Source Type: Journal    
DOI: 10.1143/JPSJ.73.2932     Document Type: Article

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