Imaging simulation of maskless lithography using a DMD™

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5645, Issue , 2005, Pages 307-314

  Liu, Chi ^a   Guo, Xiaowei ^a   Gao, Fuhua ^a   Luo, Boliang ^a   Duan, Xi ^a   Du, Jinglei ^a   Qiu, Chuankai ^b  

^a SICHUAN UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

DMD; Mask pattern; Maskless lithography; Microlens

Indexed keywords

COMPUTER SIMULATION; IMAGING SYSTEMS; IMAGING TECHNIQUES; LIGHT MODULATORS; MICROLENSES; MICROSTRUCTURE; MIRRORS; REAL TIME SYSTEMS;

DMD; MASK PATTERN; MASKLESS LITHOGRAPHY; REAL-TIME MASKS;

LITHOGRAPHY;

EID: 20044372024     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.577352     Document Type: Conference Paper

References (9)

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