Modeling and control of nanomirrors for EUV maskless lithography

2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

Volumn , Issue , 2000, Pages 602-604

  Chen, Yijian ^a,b   Shroff, Yashesh ^a   Oldham, William G ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b NONE   (United States)

Author keywords

Comb actuator; EUV maskless lithography; Nanomirror; Overshoot; Routh Hurwitz criterion; Settling time

Indexed keywords

COMPUTER SIMULATION; ELECTRIC POTENTIAL; ENERGY TRANSFER; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MOS DEVICES; NATURAL FREQUENCIES; OPTIMIZATION; PERTURBATION TECHNIQUES; RESISTORS; VACUUM;

COMB ACTUATORS; DIGITAL MICROMIRROR DEVICES (DMD); OVERSHOOT; ROUTH-HURWITZ CRITERION;

MIRRORS;

EID: 6344243444     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. N. Choksi, Y. Shroff, D. S. Pickard, Y. Chen, W. G. Oldham, M. McCord, R. F. W. Pease, D. Markle, "Maskless extreme ultraviolet lithography," J. Vac. Sci. Technol. B 17(6), Nov/Dec, 1999, pp. 3047-3051.
2. J. Younse, "Projection display systems based on the digital micromirror device (DMD)," SPIE-The International Society for Optical Engineering, vol. 2641, Austin, 1995, P64.