Tool and process optimization for 100 nm maskmaking using a 50 kV variable shaped e-beam system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 88-98

  Beyer, Dirk ^a   Löffelmacher, Dirk ^b   Goedl, Gemot ^b   Hudek, Peter ^a   Schnabel, Bernd ^a   Elster, Thomas ^a  

^a Vistec Electron Beam GmbH   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

CD control; Electron beam lithography; Fogging effect; Maskmaking; Proximity effect; SB350MW; Shaped beam

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; OPTIMIZATION; SEMICONDUCTOR DEVICES;

VARIABLE SHAPED ELECTRON BEAM SYSTEMS;

MASKS;

EID: 0035766248     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458252     Document Type: Article

References (9)

1. H. Elsner, P. Hahmann, G. Dahm, and H.W.P. Koops, "Multiple beam-shaping diaphragm for efficient exposure of gratings," J. Vac. Sci. Technol. B, Vol.11, No.6 (1993), p. 2373.
2. O. Fortagne, P. Hahmann, and Ch. Ehrlich, "WePrint 200 - The fast e-beam printer with high throughput," Microel. Engineering, Vol.27 (1995), p. 151.
3. S. Ohki et al., "Patterning performance of EB-X3 x-ray mask writer," J. Vac. Sci. Technol. B, Vol.18, No.6 (2000), p. 3084.
4. V. Chakarian et al., "Elements of an Advanced Pattern Generator for 130-100nm Maskmaking," Bacus News, Vol.16, No.7 (2000), p. 30.
5. G. Schubert, U. Kirschstein, and M. Sturm, "Nanometer Stage for Electron Beam Systems," in: Proc. of the 3rd International Conference on Ultraprecision in Manufacturing Engineering, M. Weck, and H. Kunzmann (Eds.), Verlag F. Riem, Duisburg, Germany, 1994, p.43.
6. T.H.P. Chang, "Proximity effect in electron beam lithography," J. Vac. Sci. Technol. 12 (1975) p.1271.
7. H. Eisenmann, T. Waas, H. Hartmann, "PROXECCO - Proximity effect correction by convolution," J. Vac. Sci. Technol. B, Vol. 11, No.6 (1993) p. 2741.
8. M. Ogasawara et al., "Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system," J. Vac. Sci. Technol. B, Vol.17, No.6 (1999), p. 2936.
9. Y. Nozaki, and Y. Kimura, "Fogging effect compensation technique for photomask making," Proc. SPIE 4066 (2000), p. 188.