A novel electron-beam based photomask repair tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 1222-1231

  Edinger, Klaus ^a   Becht, Hans ^a   Becker, Rainer ^a   Bert, Volker ^a   Boegli, Volker ^a   Budach, Michael ^a   Göhde, Susanne ^a   Guyot, Jochen ^a   Hofmann, Thorsten ^a   Hoinkis, Ottmar ^a   Kaya, Alexander ^a   Koops, Hans W P ^a   Spies, Petra ^a   Weyrauch, Bernd ^a   Bihr, Johannes ^b  

^a NaWoTec GmbH   (Germany)

^b LEO GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ETCHING; IMAGING SYSTEMS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; QUARTZ; SCANNING ELECTRON MICROSCOPY;

PATTERN GENERATION; PHOTOMASKS;

MASKS;

EID: 11144357577     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.532866     Document Type: Conference Paper

References (7)

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3. Morgan, J. C. Focused ion beam mask repair; Solid State Technology 41, 61 (1998)
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5. Liang, Ted and Stivers, Alan. Damage-free Mask Repair Using Electron Beam Induced Chemical Reactions. Proc. SPIE 4688, 375 (2002)
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7. Koops, H. W. P., Kretz, J., Rudolph, M., Weber, M., Dahm, G., and Lee, K. L. Characterization and application of materials grown by electron-beam-induced deposition; Jpn. J. Appl. Phys., Part 1 33, 7099 (1994)