Epitaxial growth of tin oxide films on (0 0 1) TiO 2 substrates by KrF and XeCl excimer laser annealing

Applied Surface Science

Volumn 248, Issue 1-4, 2005, Pages 118-122

  Tsuchiya, T ^a   Watanabe, A ^a   Kumagai, T ^a   Mizuta, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

(0 0 1) TiO 2; Epitaxial growth; Excimer laser; KrF; MOD; SnO 2; XeCl

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DEPOSITION; EPITAXIAL GROWTH; LASER APPLICATIONS; SPIN COATING; SUBSTRATES; THERMAL EFFECTS; TIN COMPOUNDS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

EXCIMER LASER; KRF; METAL ORGANIC DEPOSITION (MOD); SNO2; TIO2; XECL;

THIN FILMS;

EID: 19944424804     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.012     Document Type: Conference Paper

References (10)

1. W.A. Badaway J. Electroanal. Chem. 281 1990 85
2. J.P. Zheng, and H.S. Kwok Appl. Phys. Lett. 63 1993 1
3. D.K. Schroder IEEE Trans. Electron Dev. 25 1978 90
4. A. Tsunashima, H. Yoshimizu, K. Kodaira, S. Shimada, and T. Matsushita J. Mat. Sci. 21 1986 2731
5. T. Tsuchiya, I. Yamaguchi, T. Manabe, T. Kumagai, and S. Mizuta Appl. Phys. A 79 2004 1541
6. T. Tsuchiya, I. Yamaguchi, T. Manabe, T. Kumagai, S. Mizuta, Appl. Surf. Sci., 2004, in press.
7. T. Tsuchiya, I. Yamaguchi, T. Manabe, T. Kumagai, and S. Mizuta Mater. Sci. Semicond. Process 5 2002 207
8. T. Tsuchiya, I. Yamaguchi, T. Manabe, T. Kumagai, and S. Mizuta Mater. Sci. Eng. B 109 2004 131
9. T. Tsuchiya, T. Yoshitake, Y. Shimakawa, I. Yamaguchi, T. Manabe, T. Kumagai, Y. Kubo, and S. Mizuta Jpn. J. Appl. Phys. 42 2003 956
10. T. Tsuchiya, T. Yoshitake, Y. Shimakawa, I. Yamaguchi, T. Manabe, T. Kumagai, Y. Kubo, and S. Mizuta J. Photochem. Photobiol. A 166 2004 123