Low-temperature growth of SnO2 film prepared by XeCl excimer laser MOD process

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1541-1544

  Tsuchiya, T ^a   Takeda, M ^a   Yamaguchi, I ^a   Manabe, T ^a   Kumagai, T ^a   Mizuta, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; CRYSTALLIZATION; EXCIMER LASERS; FILM GROWTH; INFRARED SPECTROSCOPY; LASER BEAM EFFECTS; PYROLYSIS; SINTERING; SPIN COATING; SUBSTRATES; TIN COMPOUNDS; ULTRAVIOLET RADIATION; VISCOSITY; X RAY DIFFRACTION ANALYSIS;

CHEMICAL STABILITY; CRYSTALLINE FILMS; LOW-TEMPERATURE GROWTH; METAL ORGANIC DEPOSITION (MOD);

METALLIC FILMS;

EID: 4344689966     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2843-3     Document Type: Conference Paper

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