A novel positive-type photosensitive polyimide having excellent transparency based on soluble block copolyimide with hydroxyl group and diazonaphthoquintone

Journal of Applied Polymer Science

Volumn 96, Issue 5, 2005, Pages 1619-1624

  Jin, XingZhou ^a   Ishii, Hiroyuki ^a  

^a PI R and D Co Ltd   (Japan)

Author keywords

Lithography; Polyimides; Transparency

Indexed keywords

BLOCK COPOLYMERS; CARBOXYLIC ACIDS; ESTERS; LITHOGRAPHY; PHOTORESISTS; PHOTOSENSITIVITY; TRANSPARENCY; VLSI CIRCUITS;

DISSOLUTION RATE; ETCHANTS; HYDRAZINES; HYDROXYL GROUP;

POLYIMIDES;

POLYIMIDE;

EID: 19944406521     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.21609     Document Type: Article

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