Anisotropic etching characteristics of Si in tetramethylammonium hydroxide: Isopropyl alcohol: Pyrazine solutions

Journal of the Korean Physical Society

Volumn 46, Issue 5, 2005, Pages 1152-1156

  Chung, Gwiy Sang ^a  

^a University of Ulsan   (South Korea)

Author keywords

Anisotropic etching; Etching rate; Flatness; TMAH : IPA : pyrazine solutions; Undercutting

Indexed keywords

EID: 19944376131     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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