3D metrology solution for the 65nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 905-910

  Kneedler, Rick ^a   Borodyansky, Sergey ^a   Klyachko, Dimitri ^a   Vasilyev, Leonid ^a   Buxbaum, Alex ^a   Morrison, Troy ^a  

^a Thermo Fisher Scientific   (United States)

Author keywords

65nm node; Atomic Force Microscopy (AFM); Critical Dimension (CD); Photo mask metrology; Scanning Probe Microscopy (SPM); Stylus NanoProfilometer (SNP)

Indexed keywords

65NM MODE; CRITICAL DIMENSION (CD); PHOTO-MASK METROLOGY; SCANNING PROBE MICROSCOPY (SPM); STYLUS NANOPROFILOMETER (SNP);

ATOMIC FORCE MICROSCOPY; DATA REDUCTION; OPTICAL SYSTEMS; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS;

MEASUREMENTS;

EID: 19844380119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.570122     Document Type: Conference Paper

References (4)

1. T.R. Hicks, P.D. Atherton, "The NanoPositioning Book", Queensgate Instruments Ltd., 1997.
2. J.S. Villarrubia, "Algorithms for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation", J. Res. Natl. Inst. Stand. Technol. 102(4), pp. 425-454, July-August 1997.
3. K. Moloni, T. Morrison, "Stylus Nanoprofilometry for Mask Metrology", Microlithography World 13(3), pp. 18-19,22, August 2004.
4. J.E. Griffith, D.A. Grigg, "Dimensional Metrology with Scanning Probe Microscopes", J. Appl. Phys. 74(9), pp. R83-R109, 1 November 1993.