Stylus nanoprofilometry for mask metrology

Microlithography World

Volumn 13, Issue 3, 2004, Pages

  Moloni, Katerina ^a   Morrison, Troy ^b  

^a nPoint Inc   (United States)

^b Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSIONS; PHOTOMASK METROLOGY; STYLUS NANOPROFILOMETRY;

ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MASKS; NANOTECHNOLOGY; PROFILOMETRY;

PHOTOLITHOGRAPHY;

EID: 19244365671     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. J. B Bindell, et al., "Stylus NanoProfilometry: A New Approach to CD Metrology," Solid State Technology, 42(6), pp. 45-53, June 1999.
2. R. Lipari, R. Kneedler, A. Berghaus, "3D Scanning Probe Metrology for Photomasks," Microlithography World 10(3), pp. 28-32, 40, August 2001.
3. J. Morgan, T. Morrison, "Progress for Characterization and Advanced Reticle Repair," Solid State Technology 43(7), pp. 195-201, July 2000.
4. nPoint Inc., Madison, WI (www.npoint.com).
5. J.S. Villarubia, "Morphological Estimation of Tip Geometry for Scanned Probe Microscopy," Surface Science 321, pp. 287-300, 1994.
6. J.S. Villarubia, "Algorithms for Scanned Probe Microscope Image Simulation, Surface Reconstruction, and Tip Estimation," J. Res. of the NIST, 102(4), pp. 425-454, July-Aug. 1997.