Tracking down causes of DUV sub-pellicle defects

Solid State Technology

Volumn 43, Issue 6, 2000, Pages 159-160,-162,-165,-168,-170

  Grenon, Brian J ^a   Peters, Charles R ^b   Bhattacharyya, Kaustuve ^c  

^a Grenon Consulting Inc   (United States)

^b Dominion Semiconductor   (United States)

^c KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; DEFECTS; ENERGY DISPERSIVE SPECTROSCOPY; FAILURE ANALYSIS; INSPECTION; MASKS; ORGANIC POLYMERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE MANUFACTURE;

DEFECT DETECTION SYSTEMS; PHOTOMASK PELLICLE; SUBPELLICLE DEFECTS;

LITHOGRAPHY;

EID: 0343006831     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. V. Shea, W.J. Wojcik, "Pellicle cover for projection printing system," US Patent 4, 131, 363, December 26, 1978.
2. J.S. Gordon, "Pellicles designed for high performance lithographic processes," SPIE, Vol. 2512, pp. 99-111, 1995.
3. M. Windholz, Editor, The Merck Index, Ninth Ed., Merck and Co., Rahway, NJ, pp. 69-70, 1976.