Development of deep-UV MoSi-based embedded phase-shifting mask (EPSM) blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 403-411

  Ushida, Masao ^a   Mitsui, Masaru ^a   Okada, Kimihiri ^a   Okubo, Yasushi ^a   Suda, Hideki ^a   Kobayashi, Hideo ^a   Asakawa, Keishi ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

Embedded phase shifting mask (EPSM); MoSi; Photomask blanks; Reticle

Indexed keywords

CHEMICAL STABILITY; MASKS; OPTICAL INSTRUMENTS; PHOTOMASKS; PLASMA ETCHING;

CHEMICAL DURABILITIES; DEEP UV; EMBEDDED PHASE-SHIFTING MASK (EPSM); ETCHING PROPERTIES; FABRICATION PROCESSES; MOSI; NITROGEN GASSES; PHASE-SHIFT; PHOTOMASK BLANKS; RETICLE; SIMPLE STRUCTURES; SPUTTERING CONDITIONS;

OPTICAL RESOLVING POWER;

EID: 19844364960     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262825     Document Type: Conference Paper

References (7)

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