Ta-Si-O absorptive shifter for the attenuated phase-shifting mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 155-164

  Yan, Y S ^a   Cheng, C C ^a   Lin, C L ^a   Gan, J Y ^a   Wu, T B ^a   Tuo, L C ^b   Wang, J J ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Apsm; Attenuated phase shifting mask; Phase shifting mask; Psm; Variable angle spectroscopic ellipsometer

Indexed keywords

MASKS; OPTICAL RESOLVING POWER; PHOTOMASKS; REACTIVE SPUTTERING; REFRACTIVE INDEX; SILICON; SILICON COMPOUNDS; TANTALUM COMPOUNDS; X RAYS;

APSM; DEFECT INSPECTION; DUV LITHOGRAPHY; EXTINCTION COEFFICIENTS; OPTIMUM CONDITIONS; OXYGEN FLOW RATES; PHASE-SHIFTING MASK; SPECTROSCOPIC ELLIPSOMETERS;

COMPOSITE FILMS;

EID: 85054301759     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245212     Document Type: Conference Paper

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