(LaNiO3)x(Ta2O5)1-xoxide thin films for attenuated phase-shifting mask blank

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 146-154

  Cheng, C C ^a   Wu, T B ^a   Gan, J Y ^a   Tuo, L C ^b   Wang, J J ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Apsm; Duv; I line; Lanio3; Phase shift mask; Ta2O5; Vase

Indexed keywords

MAGNETRON SPUTTERING; MASKS; OPTICAL PROPERTIES; OPTICAL RESOLVING POWER; PHOTOMASKS; X RAYS;

APSM; LANIO3; PHASE-SHIFT MASK; TA2O5; VASE;

TANTALUM OXIDES;

EID: 57949092513     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245211     Document Type: Conference Paper

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