Measurement of residual stress in multicrystalline silicon ribbons by a self-calibrating infrared photoelastic method

Review of Scientific Instruments

Volumn 76, Issue 1, 2005, Pages

  Brito, M C ^a   Pereira, J P ^a   Alves, J Maia ^a   Serra, J M ^a   Vallera, A M ^a  

^a Centro de Fisica da Materia Condensada   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CRYSTALLINE MATERIALS; FLAT CABLES; INFRARED RADIATION; NONDESTRUCTIVE EXAMINATION; PHOTOELASTICITY; REFRACTIVE INDEX; SILICON WAFERS; STRESSES; TENSORS;

INFRARED PHOTOELASTIC METHODS; MULTICRYSTALLINE; NONDESTRUCTIVE METHODS; SILICON RIBBONS;

RESIDUAL STRESSES;

EID: 19744383862     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1823654     Document Type: Article

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