Fabrication and calibration of a gas sensor based on chemically vapor deposited WO3 films on silicon substrates: Application to H2 sensing

Sensors and Actuators, B: Chemical

Volumn 77, Issue 1-2, 2001, Pages 359-362

  Davazoglou, D ^a   Dritsas, T ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Fabrication; H2 sensing; LPCVD; Silicon substrates; WO3

Indexed keywords

CHEMICAL VAPOR DEPOSITION; POLYSILICON; RESISTORS; SENSITIVITY ANALYSIS; SILICON; SUBSTRATES; THIN FILMS; TUNGSTEN COMPOUNDS;

LOW PRESSURE CHEMICALLY VAPOR DEPOSITION (LPCVD); TEMPERATURE-SENSING RESISTORS;

CHEMICAL SENSORS;

EID: 0035876308     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)00734-1     Document Type: Article

References (10)

1. A low-cost sensor for the detection of Hydrogen
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7. 6 pyrolysis
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