Thermal Conductivity Measurements of Thin Amorphous Silicon Films by Scanning Thermal Microscopy

International Journal of Thermophysics

Volumn 23, Issue 6, 2002, Pages 1645-1657

  Volz, S ^a   Feng, X ^b   Fuentes, C ^a   Guerin P ^c   Jaouen, M ^c  

^a ENSMA   (France)

^b TSINGHUA UNIVERSITY   (China)

^c UNIVERSITÉ DE POITIERS   (France)

Author keywords

Amorphous silicon films; Interface thermal resistance; Scanning thermal microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FINITE VOLUME METHOD; HEAT RESISTANCE; NANOSTRUCTURED MATERIALS; SPUTTERING; THERMAL CONDUCTIVITY; THIN FILMS;

AMORPHOUS SILICON FILMS; ATOMIC FORCE MICROSCOPES; INTERFACE RESISTANCE; SCANNING THERMAL MICROSCOPY;

AMORPHOUS SILICON;

EID: 1942537907     PISSN: 0195928X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1020750203199     Document Type: Article

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