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Volumn 95, Issue 7, 2004, Pages 3324-3333

Analysis of emission data from O 2 plasmas used for microbe sterilization

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA TREATMENT; RADIATIVE EMISSION; VIBRATIONAL ENERGY;

EID: 1942521256     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1650921     Document Type: Review
Times cited : (13)

References (53)
  • 10
    • 1942461114 scopus 로고    scopus 로고
    • S. J. Fraser, R. L. Olson, and W. M. Leavens, NASA-CR-146314 (1976)
    • S. J. Fraser, R. L. Olson, and W. M. Leavens, NASA-CR-146314 (1976).
  • 15
    • 1942493549 scopus 로고
    • U.S. Patent No. 4207286
    • R. M. G. Boucher, U.S. Patent No. 4207286 (1980).
    • (1980)
    • Boucher, R.M.G.1
  • 37
    • 0003072237 scopus 로고
    • edited by R. H. Huddlestone and S. L. Leonard Academic, New York
    • F. F. Chen, in Plasma Diagnostic Techniques, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965), p. 113.
    • (1965) Plasma Diagnostic Techniques , pp. 113
    • Chen, F.F.1
  • 46
    • 1942493538 scopus 로고    scopus 로고
    • M. V. V. S. Rao, S. P. Sharma, B. A. Cruden, A. A. Bol'shakov, and M. Meyyappan, (unpublished)
    • M. V. V. S. Rao, S. P. Sharma, B. A. Cruden, A. A. Bol'shakov, and M. Meyyappan, (unpublished).
  • 51
    • 1942461091 scopus 로고    scopus 로고
    • private communication
    • D. B. Hash, (private communication).
    • Hash, D.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.