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Volumn 5, Issue , 2003, Pages 115-123

Micro, internal-combustion engine fabrication with 900 μm deep features via DRIE

Author keywords

[No Author keywords available]

Indexed keywords

GEARS; MASKS; MICROACTUATORS; MICROELECTROMECHANICAL DEVICES; PHOTORESISTS; REACTIVE ION ETCHING; ROTORS; SILICON; SURFACE ROUGHNESS;

EID: 1942520322     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/imece2003-42558     Document Type: Conference Paper
Times cited : (11)

References (10)
  • 5
  • 8
    • 84903621946 scopus 로고    scopus 로고
    • Robert Bosch GmbH, Pat. 4,855,017 and 4,784,720 (USA) and 4241045C1 (Germany) (1994)
    • Robert Bosch GmbH, Pat. 4,855,017 and 4,784,720 (USA) and 4241045C1 (Germany) (1994).
  • 10
    • 0035768534 scopus 로고    scopus 로고
    • Low Frequency Process for Silicon On Insulator Deep Reactive Ion Etching
    • Wasilik, M. and A. P. Pisano, 2001, "Low Frequency Process for Silicon On Insulator Deep Reactive Ion Etching", Proceedings of the SPIE, 4592, pp. 462472.
    • (2001) Proceedings of the SPIE , vol.4592 , pp. 462-472
    • Wasilik, M.1    Pisano, A.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.