Refractive index control and etching of C-S-Au film by plasma processes

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 639-642

  Matushita, Masaki ^a   Kashem, Md Abdul ^a   Morita, Shinzo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

C S Au film; Electronic polarizability; O2 plasma etching; Refractive index; RF plasma CVD; Sputtering

Indexed keywords

AMORPHOUS MATERIALS; ELECTRODES; OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX;

PHOTONIC CRYSTALS;

THIN FILMS;

CARBON; COATING; PLASMA TREATMENT; SURFACE TREATMENT;

EID: 19244383783     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00091-4     Document Type: Article

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