Chemistry of sulfur doping mechanism in amorphous carbon by plasma CVD of methane

Journal of Photopolymer Science and Technology

Volumn 12, Issue 1, 1999, Pages 11-14

  Matsushita, Masaki ^b   Harum, Mohd Zarid Bin ^a   Kashem, Md Abul ^a   Morita, Shinzo ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b Meinan Technical High School   (Japan)

Author keywords

Amorphous carbon; Doping mechanism; Methane; Plasma CVD; SF6; Sulfur doping

Indexed keywords

EID: 0002656082     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.11     Document Type: Article

References (5)

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4. Osamu Tsuji, Mikio Sawai, Hirohiko Nakano and Takeshi Minaguchi; J. Photopolym. Sci. Tech., 8(3)(1995) 393-398.
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