Co-operation process of plasma CVD and sputtering, using methane, SF6 and Ar mixture gas, and gold plate discharge electrode

Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 50-53

  Matsushita, Masaki ^a   Kashem, Abul ^a   Morita, Shinzo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

C S Au composite film; Refractive index; RF plasma CVD; Sputtering

Indexed keywords

ATOMS; COMPOSITE MATERIALS; ELECTRODES; GOLD PLATING; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLARIZATION; REFRACTIVE INDEX; SPUTTERING;

DISCHARGE ELECTRODES;

THIN FILMS;

EID: 0037155428     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00011-1     Document Type: Conference Paper

References (11)