CVD of conformal aluminathin films via hydrolysis of AlH3(NMe2Et)

Advanced Functional Materials

Volumn 10, Issue 3-5, 2000, Pages 135-144

  Fahlman, Bradley D ^a   Barron, Andrew R ^a,b  

^a RICE UNIVERSITY   (United States)

^b Rice University   (United States)

Author keywords

Alane; Alumina; Chemical vapour deposition; Conformal; EL phosphor; Thin film

Indexed keywords

ALANE PRECURSORS; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD);

ALUMINA; CARBON FIBERS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; ETCHING; FILM GROWTH; HYDROLYSIS; QUARTZ; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

THIN FILMS;

EID: 19044394175     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/1099-0712(200005/10)10:3/5<135::aid-amo400>3.0.co;2-m     Document Type: Article

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