The influence of gas chemistry on plasma-induced damage during poly-Si etching

Vide: Science, Technique et Applications

Volumn , Issue 291 SUPPL.2, 1999, Pages 110-112

  Richter, Harald H ^a   Aminpur, Massud A ^a,b   Wolff, André ^a   Sorge, Roland ^a   Barth, Rainer ^a  

^a IHP   (Germany)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 18944399272     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. J.P. McVittie, Techn. Dig. IEDM, pp. 433-436, 1997.
2. S. Ma, M. Jain and J.D. Chinn, J. Vac. Sci. Technol. A16, pp. 1440-1443, 1998.
3. W.E. Frank and T. Chabert, J. Electrochem. Soc. 140, pp. 497-502, 1993.