Nano-aluminum-induced low-temperature crystallization of PECVD amorphous silicon

Electrochemical and Solid-State Letters

Volumn 8, Issue 5, 2005, Pages

  Zou, Min ^a   Cai, Li ^b   Brown, William ^b  

^a 3202 Bell Engineering Center   (United States)

^b UNIVERSITY OF ARKANSAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTALLIZATION; LOW TEMPERATURE PHENOMENA; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DEVICES; STRESS ANALYSIS; TENSILE STRESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SILICON FILMS; SURFACE FILMS; THERMAL CYCLES;

AMORPHOUS SILICON;

EID: 18944380341     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1874633     Document Type: Article

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