High temperature oxidation mechanism of TiAl-W-Si alloys

Materials Science Forum

Volumn 449-452, Issue II, 2004, Pages 817-820

  Lee, D B ^a   Woo, S W ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Intermetallics; Oxidation; Silicon; TiAl; Tungsten

Indexed keywords

DIFFUSION; ENERGY DISPERSIVE SPECTROSCOPY; HIGH TEMPERATURE OPERATIONS; INTERMETALLICS; OXIDATION; SILICON; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

BARRIER LAYERS; GLANCING ANGLE XRD; TIAL;

TITANIUM ALLOYS;

EID: 18844465002     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.449-452.817     Document Type: Conference Paper

References (11)

1. Y. W. Kim, J. Met. Vol. 46, July, (1994) p. 30.
2. A. Tomasi, C. Noseda, M. Nazmy, S. Gialanella, MRS Symp. Proc. Vol. 460 (1997) p. 225.
3. Y. Shida and H. Anada, Corros. Sci. Vol. 35, (1993) p.945.
4. H. Anada and Y. Shida, J. Jpn Inst. Met. Vol. 58 (1994) p. 1036.
5. Y. Shida and H. Anada, Mater. Trans. JIM, Vol. 35 (1994) p. 623.
6. Y. Shida and H. Anada, Oxid. Met. Vol. 45 (1996) p. 197.
7. S. A. Kekare and P. B. Aswath, J. Mater. Sci. Vol. 32 (1997) p. 2485.
8. M. Yoshihara, Y. W. Kim, Gamma Titanium Aluminides 1999 (TMS, USA, 1999) p. 753.
9. A. Tomasi, S. Gialanella, P. G. Orsini and M. Nazmy, MRS Symp. Proc. Vol. 364 (1995) p. 999.
10. M. P. Brady, W. J. Brindley, J. L. Smialek and I. E. Locci, J. Met Vol. 48, Nov. (1996) p. 46.
11. D. B. Lee, W. S. Shim, and D. Y. Seo, Mater. Sci. Forum, Vol. 462/432 (2003) p. 1819.