High temperature oxidation of Ti-(43-52%)Al-2%W-(0-0.5%)Si intermetallics

Materials Science Forum

Volumn 426-432, Issue 3, 2003, Pages 1819-1824

  Lee, D B ^a   Shim, W S ^a   Seo, D Y ^b  

^a Sungkyunkwan University   (South Korea)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Intermetallics; Oxidation; Silicon; TiAl; Tungsten

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; CRYSTAL MICROSTRUCTURE; ENERGY DISPERSIVE SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; HOT ISOSTATIC PRESSING; INTERMETALLICS; MICROANALYSIS; OXIDATION RESISTANCE; THERMOGRAVIMETRIC ANALYSIS; THERMOOXIDATION; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ELECTRON PROBE MICROANALYSIS (EPM);

TITANIUM ALLOYS;

EID: 0038677622     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.426-432.1819     Document Type: Conference Paper

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