Oxidation of TiAl based intermetallics

Journal of Materials Science

Volumn 32, Issue 9, 1997, Pages 2485-2499

  Kekare, S A ^a,b   Aswath, P B ^a  

^a The University of Texas at Arlington   (United States)

^b Rockwell Semiconductor Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHROMIUM; COMPOSITION EFFECTS; HIGH TEMPERATURE EFFECTS; INTERMETALLICS; MANGANESE; OXIDATION; REACTION KINETICS; STOICHIOMETRY; TITANIUM DIOXIDE; TUNGSTEN; VANADIUM;

TITANIUM ALUMINIDE;

TITANIUM ALLOYS;

EID: 0031145303     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018529829167     Document Type: Article

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