Optical emission from pulsed dc magnetron sputtering plasmas

IEEE Transactions on Plasma Science

Volumn 33, Issue 2 I, 2005, Pages 348-349

  Lopez, Jose ^a   Zhu, WeiDong ^a   Freilich, Alfred ^a   Belkind, Abraham ^a   Becker, Kurt ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

Alumina; Imaging; Magnetron plasma; Optical emissions; Sputter deposition

Indexed keywords

ALUMINA; CHARGE COUPLED DEVICES; DIELECTRIC FILMS; ELECTRIC ARCS; ELECTRIC CURRENTS; ELECTRODES; IMAGING TECHNIQUES; LIGHT EMISSION; MAGNETRON SPUTTERING; MICROSCOPIC EXAMINATION; PRESSURE EFFECTS; SPUTTER DEPOSITION;

ARCING; MAGNETRON SPUTTERING PLASMA; OPTICAL PLASMA EMISSION; PLASMA POWER;

PLASMAS;

EID: 18844447986     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.845048     Document Type: Article

References (5)

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3. A. Belkind, Z. Zhao, D. Carter, G. McDonough, G. Roche, and R. Scholl, "Time-resolved investigation of pulsed dc magnetron plasma," presented at the Int. Conf. Metallurgical Coatings Thin Films, San Diego, CA, Apr. 30-May 4 2001.
4. J. W. Bradley, H. Bäcker, P. J. Kelly, and R. D. Arnell, "Time-resolved Langmuir probe measurements at the substrate position in a pulsed midfrequency dc magnetron plasma," Surf. Coat. Technol., vol. 135, pp. 221-228, 2001.
5. J. W. Bradley, H. Bäcker, P. J. Kelly, and R. D. Arnell, "Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system," Surf. Coat. Technol., vol. 142-144, pp. 337-341, 2001.