Hα emission as a feedback control sensor for reactive sputter deposition of nano-structured, diamond-like carbon coatings

IEEE Transactions on Plasma Science

Volumn 33, Issue 2 II, 2005, Pages 799-807

  Klepper, C Christopher ^a   Carlson, Eric P ^a   Hazelton, Robert C ^a   Yadlowsky, Edward J ^a   Feng, Bao ^b   Taher, Mahmoud A ^b   Meyer III, Harry M ^c,d  

^a HY Tech Research Corporation   (United States)

^b CATERPILLAR INC   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

^d OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Atomic physics; Closed loop systems; Coatings; Plasma measurements; Process control; Sputtering; Thin films

Indexed keywords

ATOMIC PHYSICS; CLOSED LOOP CONTROL SYSTEMS; COATINGS; FEEDBACK CONTROL; NANOSTRUCTURED MATERIALS; PLASMAS; PROCESS CONTROL; SENSORS; THIN FILMS;

DIAMOND-LIKE CARBON COATINGS; PLASMA MEASUREMENTS;

SPUTTER DEPOSITION;

EID: 18844427284     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.844531     Document Type: Article

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