Determination of scattering losses in ArF* excimer laser alldielectric mirrors for 193 nm microlithography applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5647, Issue , 2005, Pages 9-22

  Rudisill, J Earl ^a   Duparre, Angela ^b   Schroeder, Sven ^b  

^a NEWPORT CORPORATION   (United States)

^b FRAUNHOFER GESELLSCHAFT   (Germany)

Author keywords

Coatings; DUV; Microlithography; Scattering; Thin Films

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; IRRADIATION; LASER PULSES; LITHOGRAPHY; OPTICAL COATINGS; SCATTERING; THIN FILMS;

ARGON FLUORIDE; COATING MATERIALS; DEEP ULTRAVIOLET (DUV); LASER RADIOMETRY;

EXCIMER LASERS;

EID: 18744396400     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.584743     Document Type: Conference Paper

References (9)

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