Correlation of structure and magnetism in GaAs with embedded Mn(Ga)As magnetic nanoclusters

Journal of Applied Physics

Volumn 92, Issue 8, 2002, Pages 4672-4677

  Moreno, M ^a   Trampert, A ^a   Jenichen, B ^a   Daweritz L ^a   Ploog, K H ^a  

^a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSE SCATTERING; FERROMAGNETIC BEHAVIORS; GAAS; GAAS THIN FILMS; GRANULAR FILM; GRANULAR LAYER; LOW TEMPERATURE MOLECULAR BEAM EPITAXY; MAGNETIC NANOCLUSTERS; STRUCTURAL AND MAGNETIC PROPERTIES; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICE MAGNETOMETRY; ZINC-BLENDE;

GALLIUM ARSENIDE; MAGNETIC PROPERTIES; MAGNETISM; MANGANESE COMPOUNDS; NANOCLUSTERS; RAPID THERMAL ANNEALING; SEMICONDUCTING GALLIUM; SQUIDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC SULFIDE;

MANGANESE;

EID: 18744386377     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506402     Document Type: Article

References (21)

1. G. A. Prinz, Science 250, 1092 (1990). sci SCIEAS 0036-8075
2. M. Tanaka, J. P. Harbison, T. Sands, T. L. Cheeks, V. G. Keramidas, and G. M. Rothberg, J. Vac. Sci. Technol. B 12, 1091 (1994). jvb JVTBD9 0734-211X
3. M. Tanaka, J. P. Harbison, and G. M. Rothberg, J. Cryst. Growth 150, 1132 (1995). jcr JCRGAE 0022-0248
4. H. Ohno, A. Shen, F. Matsukura, A. Oiwa, A. Endo, S. Katsumoto, and Y. Iye, Appl. Phys. Lett. 69, 363 (1996). apl APPLAB 0003-6951
5. T. Hayashi, M. Tanaka, T. Nishinaga, H. Shimada, H. Tsuchiya, and Y. Otuka, J. Cryst. Growth 175/176, 1063 (1997). jcr JCRGAE 0022-0248
6. M. Tanaka, J. Vac. Sci. Technol. B 16, 2267 (1998). jvb JVTBD9 0734-211X
7. M. Tanaka, J. P. Harbison, M. C. Park, Y. S. Park, T. Shin, and G. M. Rothberg, Appl. Phys. Lett. 65, 1964 (1994). apl APPLAB 0003-6951
8. M. Tanaka, K. Saito, and T. Nishinaga, Appl. Phys. Lett. 74, 64 (1999). apl APPLAB 0003-6951
9. T. Hayashi, M. Tanaka, K. Seto, T. Nishimaga, and K. Ando, Appl. Phys. Lett. 71, 1825 (1997). apl APPLAB 0003-6951
10. F. Matsukura, H. Ohno, A. Shen, and Y. Sugawara, Phys. Rev. B 57, R2037 (1998). prb PRBMDO 0163-1829
11. J. De Boeck, R. Oesterholt, A. Van Esch, H. Bender, C. Bruynseraede, C. Van Hoof, and G. Borghs, Appl. Phys. Lett. 68, 2744 (1996). apl APPLAB 0003-6951
12. H. Shimizu, M. Miyamura, and M. Tanaka, J. Vac. Sci. Technol. B 18, 2063 (2000). jvb JVTBD9 0734-211X
13. P. J. Wellmann, J. M. Garcia, J.-L. Feng, and P. M. Petroff, Appl. Phys. Lett. 71, 2532 (1997). apl APPLAB 0003-6951
14. K. Ando, A. Chiba, and H. Tanoue, Appl. Phys. Lett. 73, 387 (1998). apl APPLAB 0003-6951
15. P. J. Wellmann, J. M. Garcia, J.-L. Feng, and P. M. Petroff, Appl. Phys. Lett. 73, 3291 (1998). apl APPLAB 0003-6951
16. S. U. Yuldashev, Y. Shon, Y. H. Kwon, D. J. Fu, D. Y. Kim, H. J. Kim, T. W. Kang, and X. Fan, J. Appl. Phys. 90, 3004 (2001). jap JAPIAU 0021-8979
17. H. Akinaga, J. De Boeck, G. Borghs, S. Miyanishi, A. Asamitsu, W. Van Roy, Y. Tomioka, and L. H. Kuo, Appl. Phys. Lett. 72, 3368 (1998). apl APPLAB 0003-6951
18. H. Akinaga, S. Miyanishi, K. Tanaka, W. Van Roy, and K. Onodera, Appl. Phys. Lett. 76, 97 (2000). apl APPLAB 0003-6951
19. M. Tanaka, H. Shimizu, and M. Miyamura, J. Cryst. Growth 227, 839 (2001). jcr JCRGAE 0022-0248
20. Y. Morishita, K. Iida, J. Abe, and K. Sato, Jpn. J. Appl. Phys., Part 2 36, L1100 (1997). jjc JAPLD8 0021-4922
21. J. Shi, J. M. Kikkawa, D. D. Awschalom, G. Medeiros-Ribeiro, P. M. Petroff, and K. Babcock, J. Appl. Phys. 79, 5296 (1996). jap JAPIAU 0021-8979