Methods for mitigating surface damage growth on NIF final optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4679, Issue , 2002, Pages 23-33

  Hrubesh, L W ^a   Norton, M A ^a   Molander, W A ^a   Donohue, E E ^a   Maricle, S M ^a   Penetrante, B M ^a   Brusasco, R M ^a   Grundler, W ^a   Butler, J A ^a   Carr, J W ^a   Hill, R M ^a   Summers, L J ^a   Feit, M D ^a   Rubenchik, A ^a   Key, M H ^a   Wegner, P J ^a   Burnham, A K ^a   Hackel, L A ^a   Kozlowski, M R ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Chemical etching; CO2 laser processing; Damage growth mitigation; Laser damage; Plasma etching

Indexed keywords

CARBON DIOXIDE; FUSED SILICA; LASER OPTICS; PLASMA ETCHING;

WET CHEMICAL ETCHING;

LASER DAMAGE;

EID: 18644379511     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.461723     Document Type: Article

References (9)

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