Chemical etch effects on laser-induced surface damage growth in fused silica

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4347, Issue , 2001, Pages 553-559

  Hrubesh, L W ^a   Norton, M A ^a   Molander, W A ^a   Wegner, P J ^a   Staggs, M ^a   Demos, S G ^a   Britten, J A ^a   Summers, L J ^a   Lindsey, E F ^a   Kozlowski, M R ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Chemical etching; Damage growth mitigation; Fluorescence diagnostics; Laser damage

Indexed keywords

ETCHING; FLUORESCENCE; LASER DAMAGE; LASER PULSES; SCANNING ELECTRON MICROSCOPY;

CHEMICAL ETCHING; DAMAGE GROWTH MITIGATIONS; LASER FLUORESCENCE;

FUSED SILICA;

EID: 17944372099     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425054     Document Type: Conference Paper

References (5)

1. Effects of polishing, etching, cleaving, and water leaching on UV laser damage of fused silica
2. Effects of wet etch processing on laser-induced damage of fused silica surfaces
3. Wet chemical etching of silicate glasses in hydrofluoric acid based solutions
4. Surface roughness of silicate glasses etched in hydrofluoric acid solutions