Innovative imaging of ultra-fine line without using any strong RET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 503-514

  Nakao, Shuji ^a   Narimatsu, Kouichirou ^a   Miyagi, Tadashi ^a   Ogawa, Sachiko ^a   Tamada, Naohisa ^a   Nakae, Akihiro ^a   Tokui, Akira ^a   Tsujita, Kouichrou ^a   Arimoto, Ichirou ^a   Wakamiya, Wataru ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

High exposure level; Low MEF; No strong RET; Pair of bright lines; Sub 100 nm isolated line pattern

Indexed keywords

ABERRATIONS; IMAGING TECHNIQUES; MASKS; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY;

LENS ABERRATION;

PHOTOLITHOGRAPHY;

EID: 18544385305     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435750     Document Type: Article

References (6)

1. H. Jinbo, et al.: Tech. Dig. of IEDM 1990 p.825.
2. H.Y. Liu, L. Kerklin et. al.: Proc. SPIE 3334(1998)2.
3. S. Hatta, T. Onozuka, K. Fukumoto, S. Shirai and S. Okazaki: Proc. SPIE 3334(1998)p.598.
4. S. Nakao, I. Kanai, K. Tsujita, I. Arimoto and W. Wakamiya: Proc. SPIE 4000(2000)p.1287.
5. T. Saito, H. Watanabe and M Sasago: Jpn. J. Appl. Phys. 38(1999)p.7017.
6. Y.T. Chen, C.H. Lin, H.T. Lin, H.C. Hsieh, S.S. Yu and A. Yen: Proc. SPIE4000(2000)p.99.