In situ lateral patterning of thin films of various materials deposited by physical vapor deposition

Journal of Materials Research

Volumn 19, Issue 2, 2004, Pages 595-599

  Zhang, Chi ^a   Kalyanaraman, Ramki ^a  

^a WASHINGTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; EVAPORATION; ION BEAMS; LIGHT INTERFERENCE; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; STATISTICAL METHODS; SUBSTRATES;

INTERFERENCE FRINGES; LATERAL PATTERNING;

THIN FILMS;

EID: 1842715136     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2004.19.2.595     Document Type: Article

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