Analysis of Leakage Current of Low-k Materials for Use as Interlayer Dielectric

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 1, 2004, Pages 86-90

  Fukuda, Takuya ^a   Nishino, Hirotaka ^a   Yanazawa, Hiroshi ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

C V characteristics; Charge distribution function; Flat band voltage; I V characteristics; Insulator; Leakage current; Low k; Mobile charge

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC MATERIALS; ELECTRIC INSULATORS; ELECTRIC POTENTIAL; ELECTRONS; GLASS TRANSITION; LEAKAGE CURRENTS; METALLIC FILMS;

CHARGE DISTRIBUTION FUNCTION; FLAT-BAND VOLTAGE; INTERLAYER DIELECTRICS;

MATERIALS SCIENCE;

EID: 1842710075     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.86     Document Type: Article

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