SCOPUS 정보 검색 플랫폼

Volumn 44, Issue 1, 2004, Pages 108-114

Application of pulsed voltage to d.c. glow discharge plasma for controlling the sputtering rate in glow discharge optical emission spectrometry

Author keywords

Chromium; Glow discharge optical emission spectrometry; Light modulation; Pulsed voltage; Sputtering rate; Steel

Indexed keywords

CHROMIUM; EMISSION SPECTROSCOPY; LIGHT MODULATION; OPTICAL RESOLVING POWER; PLASMAS; SIGNAL TO NOISE RATIO; SPUTTERING; STEEL;

GLOW DISCHARGE PLASMA; OPTICAL EMISSION SPECTROMETRY; PULSE VOLTAGE; PULSED VOLTAGE;

GLOW DISCHARGES;

EID: 1842684887 PISSN: 09151559 EISSN: None Source Type: Journal
DOI: 10.2355/isijinternational.44.108 Document Type: Article

Times cited : (10)

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