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Volumn 39, Issue 5, 2004, Pages 1615-1620
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In-situ atomic force microscopic study of reverse pulse plated Cu/Co-Ni-Cu films
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CYCLIC VOLTAMMETRY;
ELECTROCHEMISTRY;
ELECTRODEPOSITION;
ELECTRODES;
MORPHOLOGY;
SURFACE ROUGHNESS;
SYNTHESIS (CHEMICAL);
X RAY DIFFRACTION ANALYSIS;
POTENTIOSTATIC PULSES;
PULSE DEPOSITION;
METALLIC FILMS;
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EID: 1842588340
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/B:JMSC.0000016160.97771.44 Document Type: Article |
Times cited : (8)
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References (29)
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