Interdiffusion and thermal stability in magnetic tunnel junction ferromagnet/insulator/ferromagnet trilayer structures

Journal of Applied Physics

Volumn 95, Issue 6, 2004, Pages 3037-3040

  Park, Sungkyun ^a,b   Keavney, David J ^a,c   Falco, Charles M ^a  

^a UNIVERSITY OF ARIZONA   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC TUNNEL JUNCTIONS (MTJ); TRILAYER STRUCTURES;

ALUMINUM; ANNEALING; IMAGE ANALYSIS; INTERDIFFUSION (SOLIDS); MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; SCANNING TUNNELING MICROSCOPY; SILICON WAFERS; THERMODYNAMIC STABILITY; TUNNEL JUNCTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROMAGNETIC MATERIALS;

EID: 1842583529     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1650533     Document Type: Article

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